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UV Water Purification system 58-UVW102 Catalog

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UV Water Purification system 58-UVW102

UV Water Purification system 58-UVW102

Overview :

Lab Expo UV Water Purification System 58-UVW102 is a 30 L capacited revolutionary, modular design integrated with deionization cartridge, storage tank and UV sterilizer which helps in elimination of large amount of salts and other minerals from water using RO with TOC level of < 10 ppb. The highlight feature is the UV sterilizer which destroys the DNA of micro-org making the water contamination free. This system produce and reject water at the same time. It’s designed to deliver compliant purified water with clear quality parameters and care free maintenance

Specifications:
Output of Pure water ≥ 30 L / hr.
Process Single Pass RO system
Configuration Benchtop
Water Tank capacity 30 L
Output of Ultrapure water ≥ 1 to 1.5 L / min
Resistivity at 25 °C 18.25 M Ω. cm
Conductivity at 25 °C ≤ 10 µs / cm
TOC < 10 ppb
Pyrogens / Endotoxins < 0.025 EU / ml
Bacteria < 1 cfu / ml
Particles ( > 0.22 µm ) < 1 / ml
Absorbance ( 254 nm ) ≤ 0.001
Reactive Silica ( SiO2 ) < 0.01 ppm
Heavy metal < 0.01 ppm
Electrical requirements 220 V / 50 Hz
Power ≥ 200 W
Dimensions ( L x W x H ) 340 x 550 x 530 mm
Weight 32 kg

Features:

  • 30 L tank enables buffered supply for continuous usage
  • UV sterilization reduces microbial load at point of treatment
  • Single pass RO process supports simplified purification workflow
  • <1 cfu/ml bacteria level ensures microbiological control
  • <0.025 EU/ml endotoxin level supports sensitive applications

Applications:

FunctionImplementationClinical diagnostics labs18.25 MΩ·cm resistivity ensures ultra-pure water for reagent preparationPharmaceutical QC testing&lt; 0.025 EU/ml endotoxins supports sterile formulation workflowsResearch microbiology units&lt; 1 cfu/ml bacteria level maintains aseptic experimental conditionsIndustrial process control≥ 1 to 1.5 L/min output sustains continuous equipment rinsingHealthcare instrument sterilization≤ 0.001 absorbance at 254 nm validates optical clarity for cleaning validation

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