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Lab Expo Video Metallurgical Microscope 43-MMS300 features a 10X plan eyepiece with an 18mm field of view for detailed specimen examination. The stage includes a mobile platform with coarse and fine coaxial adjustments for precise specimen handling. It consists of the Epi-fall Kolar lighting system with an anti-reflection structure for enhanced image clarity. The focusing system has separate switches for independent control of upper and lower lighting, improving flexibility.
| Eyepiece | Wide field WF10X(FNΦ18mm), Micrometre availableWide field WF15X(FNΦ13mm), Micrometre availableWide field WF20X(FNΦ10mm), Micrometre available |
| Infinite flat field achromatic objective | PL L5X/0.12 Working distance:15.5 mmPL L10X/0.25 Working distance:8.7mmPL L20X/0.40 Working distance:8.8mmPL L50X/0.70 Working distance:5.1 mm |
| Nosepiece | Quintuple (4 standard lenses of 5X, 10X, 20X, 50X, and one optional 100X) |
| Converter | Internal positioning four-hole converter |
| Focusing system | Low hand coarse and micro coaxial focusing mechanismFine adjustment accuracy of 0.002mmEquipped with an adjusting slack device to prevent slidingMechanical upper limit deviceAdjusting elastic device to prevent slidingRandom limiting device to prevent chip damage and fast focusing |
| Stage | Composite double-deck mechanical platformTable surface size: 140 mm × 132 mm (add 180 × 145 mm Flat plate platform,102 × 102 mm Glass loading platform, Facilitate the placement of larger size samples)Moving range: 76 × 50mm, precision: 0.1mm |
| Condenser | N.A.1.25Cora lighting condenser set preset center, Rack and pinion lift (Fixed type Cora lighting) |
| Illuminating system | Halogen Lamp: 100-240V AC wide voltagePower: 6V/30WAdjustable filament center, continuous adjustable light intensity, variable aperture diaphragm, variable field stop, center adjustable |
| Photograph System | 0.35X/0.5X/0.65X/1XC-Mount, Adjustable focus |
| Imaging system | 4K high-definition imaging systemUSB3.0 computer version imaging systemSuper depth of field fusion functional imaging systemHigh-precision measurement imaging systemMetallographic analysis imaging system |
| Dimensions | 570 × 470 × 260 mm |
| Net Weight | 8.3 Kgs |
| Gross Weight | 12.5 Kgs |
FunctionImplementationMetallographic sample analysis140 mm × 132 mm stage surface enables precise specimen placementHigh-magnification inspectionPL L50X/0.70 objective with 5.1 mm working distance supports detailed microstructure evaluationDigital imaging captureUSB3.0 computer version facilitates real-time image transfer to workstationsFocus adjustment precisionFine adjustment accuracy of 0.002mm allows exact focal plane controlIllumination flexibilityHalogen lamp at 6V/30W provides adjustable light intensity for varied sample contrast
USB2.0 Industrial camera
